Sébium Duo H2O

Immediate results

Gentle but effective cleansing

Gentleness of the cleansing process: 95% (1)

Eliminate 93% of microparticles on the skin (2)

Purifies the skin

Purified skin: 95% (1)

(1) Usage test on 20 volunteers aged 19 to 46, with combination or oily skin, for 7 days.

(2) Study on 33 volunteers aged 18 to 67, with normal skin.

Helps the skin be more tolerant to external agressions

External stress can make the skin reactive and sensitive.

This patented complex contributes to help the skin to be more tolerant to external agressions - regardless of the skin type - to help strengthen its resistance.

This patent by NAOS Research was designed in Aix-en-Provence and developed in our laboratories.

D.A.F.™ patented complex

This product was formulated according to the ecobiological approach of the NAOS Laboratories to care for you. At the heart of this product:

Zinc gluconate: Sanitising: helps purify the skin.Copper sulfate: sanitising, it helps purify the skin.Micellar technology: NAOS Research invented no-rinse cleansing and make-up removing micellar water. Micelles, whose composition is inspired by the skin's cell membrane, are invisible cleansing micro-droplets.They have the ability to capture impurities while preserving the skin's natural protective film.

AQUA/WATER/EAU - PEG-6 CAPRYLIC/CAPRIC GLYCERIDES - SODIUM CITRATE - ZINC GLUCONATE - COPPER SULFATE - GINKGO BILOBA LEAF EXTRACT - MANNITOL - XYLITOL - RHAMNOSE - FRUCTOOLIGOSACCHARIDES - PROPYLENE GLYCOL - CITRIC ACID - DISODIUM EDTA - CETRIMONIUM BROMIDE - FRAGRANCE (PARFUM)

The ingredients listed here are those contained in the most recent formulation of this product. As there may be a delay between its production and its distribution on the market, please refer to the ingredient list on the packaging.

morning/evening















































face

Morning and/or evening

1. 
   Soak a cotton pad with Sébium H2O Micellar Water.
   
2. 
   Gently cleanse and/or remove make-up from face.
   
3. 
   No rinsing required.